Chemically amplified resists: past, present, and future

Hiroshi Ito

doi:10.1117/12.350143

11 June 1999 Chemically amplified resists: past, present, and future

Hiroshi Ito

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350143
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The chemical amplification concept is based on the use of a photochemically-generated acid as a catalyst, which indices a cascade of chemical transformations in the resist film, providing a gain mechanism. This lithographic imaging strategy invented in 1980 has been fully accepted by the microelectronics industry and implemented in manufacture of devices by deep UV lithography employing a KrF excimer laser. The resist systems currently being developed for the next generation ArF excimer laser lithography are also built on chemical amplification. This paper reviews the development, current status, and future of chemical amplification resist.

Citation Download Citation

Hiroshi Ito "Chemically amplified resists: past, present, and future", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350143

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