Photothermoplastic-based diffraction gratings: fabrication and replication processes

Igor V. Ciapurin

doi:10.1117/12.354863

19 July 1999 Photothermoplastic-based diffraction gratings: fabrication and replication processes

Igor V. Ciapurin

Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.354863
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States

Abstract

Currently a photothermoplastic medium (PTPM) seems to be rather perspective to fabricate relief-phase diffraction gratings (DGs). The use of a two-layer PTPM comprised a photosensitive semiconductor layer and visualizing thermoplastic layer seems to be appropriate' .ThePTPM is characterized by profitable combination of high values of both photosensitivity (up to lO5lO6 cm/J) and resolution (up to 2000 mm1), with a dry developing process which is fast enough (about 1-5 s). The thinner the thermoplastic layer, the higher the resonant frequency of the PTPM and the wider the recording frequency bandwidth are allowing us to realize high-quality recording of DGs. The DGs' fabrication on PTPM seems to have advantages due to the relief-phase nature of recording process, which is rather convenient for replication of DGs2.

Citation Download Citation

Igor V. Ciapurin "Photothermoplastic-based diffraction gratings: fabrication and replication processes", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.354863

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