Fabrication of CVD-SiC thin shells for x-ray optic applications

Jitendra Singh Goela; Michael A. Pickering; Lester M. Cohen

doi:10.1117/12.363648

29 September 1999 Fabrication of CVD-SiC thin shells for x-ray optic applications

Jitendra Singh Goela, Michael A. Pickering, Lester M. Cohen

Proceedings Volume 3766, X-Ray Optics, Instruments, and Missions II; (1999) https://doi.org/10.1117/12.363648
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

CVD SILICON CARBIDE shells have been fabricated by a scalable chemical vapor deposition vapor deposition process to demonstrate the feasibility of producing thin, lightweight optics for x-ray applications. These shells were produced by depositing SiC on shaped graphite mandrels in a CVD chamber, removing the graphite mandrels from SiC deposit followed with controlled machining to produce the required double cone surface. the size of these shells is as follows: diameter equals 250-600 mm, length equals 240-400 mm and thickness equals 1.5-2.7 mm. The roundness of the inside surface of these shells was the inside surfaces of a few shells by the epoxy replication process. Testing of two SiC shells for x-ray applications yielded a half energy width of < 15 arcsecs over a wide field of view. Important issues involved in near-net-shaping and machining of these shells are discussed.

Citation Download Citation

Jitendra Singh Goela, Michael A. Pickering, and Lester M. Cohen "Fabrication of CVD-SiC thin shells for x-ray optic applications", Proc. SPIE 3766, X-Ray Optics, Instruments, and Missions II, (29 September 1999); https://doi.org/10.1117/12.363648

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