Paper
30 June 1999 Recent progress of obliquely deposited thin films for industrial applications
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Abstract
More than 10 years ago, birefringent films of metal oxides were formed by oblique vapor deposition and investigated with a view of their application to optical retardation plates. The retardation function of the films was explained in terms of the birefringence caused by the characteristic anisotropic nanostructure inside the films. These films are now classified in the genre of the so-called sculptured thin films. However, the birefringent films thus prepared are not yet industrialized even now due to the crucial lack of the durability and the yield of products. In this review paper, we describe the present status of application process of the retardation films to the information systems such as compact disc and digital versatile disc devices with a special emphasis on the uniformity of retardation properties in a large area and the stability of the optical properties of the obliquely deposited thin films. Finally, further challenges for wide application of the obliquely deposited thin films are also discussed.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Motofumi Suzuki, Tadayoshi Itoh, and Yasunori Taga "Recent progress of obliquely deposited thin films for industrial applications", Proc. SPIE 3790, Engineered Nanostructural Films and Materials, (30 June 1999); https://doi.org/10.1117/12.351241
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Cited by 6 scholarly publications.
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KEYWORDS
Thin films

Wave plates

Thin film deposition

Silver

Transmittance

Particles

Anisotropy

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