Paper
12 November 1999 Fabrication of diffractive optics and digital optics for gigahertz to optical spectrum
Yu Huang, Xiaohu Zhang, Xudong Wang, R. Jennifer Hwu
Author Affiliations +
Abstract
The fabrication of diffractive optics and digital optics on fused silica has been investigated in this paper. The diffractive optics has been fabricated by using the gray- scale mask technique. The gray scale mask is fabricated on the HERB glass. RIE is used to realize the pattern transfer from the photoresist to the fused silica for the diffractive optics and the etching for the digital optics. The processing parameters are discussed in detail and the influence of exposure and development of the photoresist are also addressed in this paper. These diffractive optics and digital optics were designed to collimate optical radiation.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu Huang, Xiaohu Zhang, Xudong Wang, and R. Jennifer Hwu "Fabrication of diffractive optics and digital optics for gigahertz to optical spectrum", Proc. SPIE 3795, Terahertz and Gigahertz Photonics, (12 November 1999); https://doi.org/10.1117/12.370213
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KEYWORDS
Photoresist materials

Optical signal processing

Photomasks

Etching

Diffractive optical elements

Photoresist developing

Silica

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