Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction

Byung-Ho Nam; Dong-Seok Kim; Byung-Jin Cho; Nam-Ki Seok; Jae Kwan Jeong; Sang-Pye Kim; Sang-Woo Kang; Young Ju Hwang; Young Jin Song

doi:10.1117/12.410760

22 January 2001 Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction

Byung-Ho Nam, Dong-Seok Kim, Byung-Jin Cho, Nam-Ki Seok, Jae Kwan Jeong, Sang-Pye Kim, Sang-Woo Kang, Young Ju Hwang, Young Jin Song

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410760
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

DUV scanner (4x) gate CD control was evaluated and compared with that of DUV stepper (5x) under the concept of total process proximity based correction (TPPC), merging all the process step error correction from mask fabrication to wafer etch process. We found that different iso-dense bias should be applied in the case of scanner. This is mainly caused by different optical proximity effect (DI-mask CD), that is, scanner shows nearly constant optical proximity effect regardless of the size of pattern CD while that of stepper is strongly dependent upon the size of pattern CD. Application of the concept of TPPC in DUV scanner enabled us to control FI CD within specification. A correction rule table was experimentally obtained using TPPC concept. Process capability of controlling gate CD in DRAM fabrication should be improved by this method.

Citation Download Citation

Byung-Ho Nam, Dong-Seok Kim, Byung-Jin Cho, Nam-Ki Seok, Jae Kwan Jeong, Sang-Pye Kim, Sang-Woo Kang, Young Ju Hwang, and Young Jin Song "Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410760

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available