Paper
20 October 2000 Microfabrication of 32x32 uncooled IR focal plane array
Weiguo Liu, Lingling Sun, Weiguang Zhu, Ooi Kiang Tan
Author Affiliations +
Proceedings Volume 4230, Micromachining and Microfabrication; (2000) https://doi.org/10.1117/12.404914
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore
Abstract
Design and fabrication of a 32 X 32 uncooled IR focal plane array based on Si micromachining technique is presented. Ferroelectric lead zirconate titanate (PZT) thin film was used as the sensing material in the array. The PZT thin film was deposited on the top of Si substrate coated with silicon dioxide, silicon nitrite, titanium and platinum. Sol-gel method was used to deposit the PZT film. Size of the sensing element is 60 X 80 micrometers 2 and pixel size is 80 X 100 micrometers 2, yields a filling factor of 60%. In order to eliminate the thermal loss from the PZT elements to silicon substrate to improve the response of the IR sensor, silicon substrate under the sensing element was etched off using KOH micromachining technique. Membrane composed of silicon dioxide and silicon nitride was formed. Membrane size as large as 3.2 X 3.8 mm2 is fabricated. Results proved that micromachining is an effective way in fabricating uncooled IR focal plane array based on ferroelectric thin films. The process is totally compatible with standard IC fabrication techniques.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weiguo Liu, Lingling Sun, Weiguang Zhu, and Ooi Kiang Tan "Microfabrication of 32x32 uncooled IR focal plane array", Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); https://doi.org/10.1117/12.404914
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KEYWORDS
Thin films

Etching

Ferroelectric materials

Silicon

Platinum

Semiconducting wafers

Micromachining

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