High-accuracy aerial image measurement for electron-beam projection lithography

Takehisa Yahiro; Noriyuki Hirayanagi; Kenji Morita; Takeshi Irita; Hajime Yamamoto; Shohei Suzuki; Hiroyasu Shimizu; Shintaro Kawata; Teruaki Okino; Kazuaki Suzuki

doi:10.1117/12.436679

20 August 2001 High-accuracy aerial image measurement for electron-beam projection lithography

Takehisa Yahiro, Noriyuki Hirayanagi, Kenji Morita, Takeshi Irita, Hajime Yamamoto, Shohei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436679
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A direct means of measuring an image blur of electron beam projection lithography (EPL) tools is described. An aerial image sensor used for the image blur measurement was fabricated and evaluated. The signal to noise ratio (SNR) was very high and the signal contrast was 97%. The measured image blur, defined as the distance between 12% and 88% of the beam edge profile, under the optimum condition was 13 nm and the measurement repeatability was 3 nm (e sigma). The measurement error due to the sensor was extremely small, and a quantitative measurement of the image blur can be realized using this technique. The application of this technique to a system calibration is demonstrated. Focus and astigmatism were measured and the optimum settings of focus coils and stigmators were determined with an excellent repeatability. The potential for this technique to provide an automated self-calibration system on the EPL tools is clearly shown.

Citation Download Citation

Takehisa Yahiro, Noriyuki Hirayanagi, Kenji Morita, Takeshi Irita, Hajime Yamamoto, Shohei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, and Kazuaki Suzuki "High-accuracy aerial image measurement for electron-beam projection lithography", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436679

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