From compliance to control: off-roadmap metrology for low-k1 lithography

Christopher P. Ausschnitt

doi:10.1117/12.436719

22 August 2001 From compliance to control: off-roadmap metrology for low-k₁ lithography

Christopher P. Ausschnitt

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436719
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The need for high-resolution metrology to verify lithography compliance with shrinking CD and overlay specifications has resulted in a variety of roadmap sanctioned approaches; notably, SEM, AFM and scatterometry. The application of optical microscopy has been relegated to overlay metrology. While high-resolution metrology is essential to the setup and qualification of lithographic processes, it is often ill suited to the demands of dynamic lithography control. The path to improved CD compliance is through improved on- produce dose and focus control. In control applications, enhanced sensitivity to what we are trying to control becomes a new handle on precision-to-tolerance. Sensitivity must be accompanied by ease of setup, speed and sampling. Modeling for correctable components of variation becomes an integral part of the metrology function. We show that the old dog optical microscopy can learn new tricks to encompass the control of dose and focus. In doing so it becomes the lead candidate for an integrated metrology solution.

Citation Download Citation

Christopher P. Ausschnitt "From compliance to control: off-roadmap metrology for low-k₁ lithography", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436719

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