Swing curve phase and amplitude effects in optical lithography

Brian Martin; Tom Tighe; Graham G. Arthur

doi:10.1117/12.436785

22 August 2001 Swing curve phase and amplitude effects in optical lithography

Brian Martin, Tom Tighe, Graham G. Arthur

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436785
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Resist swing curves have been constructed practically, and by lithography modeling, for a conventional I-line resist both for dimensions at the substrate interface and at the top of the resist. Top SEM linewidth measurements were difficult to take repeatably in automatic mode so an enhanced measurement technique was developed. The effect of stepper focus on swing curve amplitude has been studied and, for substrate dimensions, amplitude increases as focus moves away from its optimum setting.

Citation Download Citation

Brian Martin, Tom Tighe, and Graham G. Arthur "Swing curve phase and amplitude effects in optical lithography", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436785

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