Development and characterization of advanced F2 laser source for 157-nm lithography

Klaus Vogler; Frank Voss; Elko Bergmann; Uwe Stamm; Sergei V. Govorkov; Gongxue Hua; Wojciech J. Walecki

doi:10.1117/12.425040

12 April 2001 Development and characterization of advanced F₂ laser source for 157-nm lithography

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Sergei V. Govorkov, Gongxue Hua, Wojciech J. Walecki

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425040
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

The 157 nm F₂ laser is becoming the workhorse for lithography tools for the 70 nm technology node. In this paper we review our recent advances in technology and reliability of 157 nm lasers. We discuss the improved lifetimes of main laser components and their impact on Cost of Ownership (CoO) of the F₂ laser. The typical lifetime of Lambda Physik Novaline laser discharge tube, coated CaF₂ optics, and energy monitors exceeds 3 billion, 2 billion, and 2.5 billion respectively. The CoO of the F₂ lasers reaches that of ArF lasers. We also report the results of our very thorough studies on the various line-narrowing arrangements, and feasibility of amplification at 157 nm, in the context of our recent studies of the fundamental spectral properties of F₂ lasers.

Citation Download Citation

Klaus Vogler, Frank Voss, Elko Bergmann, Uwe Stamm, Sergei V. Govorkov, Gongxue Hua, and Wojciech J. Walecki "Development and characterization of advanced F₂ laser source for 157-nm lithography", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425040

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