Paper
12 April 2001 Femtosecond laser damage in dielectric coatings
Joern Bonse, Steffen Baudach, Joerg Krueger, Wolfgang Kautek, Kai Starke, Tobias Gross, Detlev Ristau, Wolfgang G. Rudolph, Jayesh C. Jasapara, Eberhard Welsch
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Abstract
Multi-shot investigations of Ti:sapphire laser (wavelength (lambda) approximately equals 800 nm) induced damage were performed in three different laboratories (BAM, Berlin; LZH, Hannover; UNM, Albuquerque). The ablation behavior of a high reflecting mirror consisting of alternating (lambda) /4- layers of Ta2O5 and SiO2 was studied. Fused silica served as substrate. The influence of the pulse duration ((tau) equals 13 - 130 fs), the pulse number (30 - (infinity) ) and the repetition rate (10 Hz - 100 MHz) on the damage threshold will be discussed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joern Bonse, Steffen Baudach, Joerg Krueger, Wolfgang Kautek, Kai Starke, Tobias Gross, Detlev Ristau, Wolfgang G. Rudolph, Jayesh C. Jasapara, and Eberhard Welsch "Femtosecond laser damage in dielectric coatings", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425056
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Cited by 11 scholarly publications.
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KEYWORDS
Laser damage threshold

Mirrors

Femtosecond phenomena

Dielectrics

Laser induced damage

Silica

Sapphire lasers

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