Pulsed laser deposition of thin films for optics applications

M. L. De Giorgi; M. Fernandez; Gilberto Leggieri; Armando Luches; Maurizio Martino; A. Zocco

doi:10.1117/12.432840

29 June 2001 Pulsed laser deposition of thin films for optics applications

M. L. De Giorgi, M. Fernandez, Gilberto Leggieri, Armando Luches, Maurizio Martino, A. Zocco

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432840
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

SiO₂ and ITO (indium tin oxide) were deposited by ablating Si, SiO and ITO targets, respectively, in low- pressure oxygen atmosphere with pulsed XeCl and KrF excimer laser. The SiO₂ and ITO films were deposited on Si<100> and glass (BK7) substrates at temperatures of 20-600 degree(s)C. The substrates were generally set parallel to the target. To reduce droplet deposition in SiO₂ films, the off-axis configuration or the so-called eclipse method, characterized by a shadow mask between target and substrate were used. Dense, continuous ITO films with resistivity as low as 1.6x10^{-4/ (Omega} cm and a high transparency (80-90%) in the visible and near-infrared regions were deposited. Ultra-thin (approximately 6 nm) films were deposited and successfully used as electrodes in optoelectronic devices. Dense, stoichiometric, thick (>2 micrometers ) SiO₂ films were deposited on substrates either at room temperature or heated at moderate temperatures (100- 600 degree(s)C). Droplet density and surface roughness strongly depend on ablation configuration. Roughness can be kept quite low (approximately 5 nm) by using the KrF laser and a quite large target-to-substrate distance (8-12 cm). It is shown that multi-component films like ITO and Silica (SiO₂) can be efficiently deposited by using the reactive pulsed laser deposition technique.

Citation Download Citation

M. L. De Giorgi, M. Fernandez, Gilberto Leggieri, Armando Luches, Maurizio Martino, and A. Zocco "Pulsed laser deposition of thin films for optics applications", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432840

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