New flexible origination technology based on electron-beam lithography and its integration into security devices in combination with covert features based on DNA authentication

John K. Drinkwater; Zbynek Ryzi; Chris S. Outwater

doi:10.1117/12.462712

19 April 2002 New flexible origination technology based on electron-beam lithography and its integration into security devices in combination with covert features based on DNA authentication

John K. Drinkwater, Zbynek Ryzi, Chris S. Outwater

Author Affiliations +

Proceedings Volume 4677, Optical Security and Counterfeit Deterrence Techniques IV; (2002) https://doi.org/10.1117/12.462712
Event: Electronic Imaging, 2002, San Jose, California, United States

Abstract

Embossed diffractive optically variable devices are becoming increasingly familiar security items on plastic cards, banknotes, security documents and on branded goods and media to protect against counterfeit, protect copyright and to evidence tamper. Equally as this devices become both more widely available there is a pressing requirement for security technology upgrades to keep ahead of technology advances available to potential counterfeiters. This paper describes a new generation electron beam DOVID origination technology particularly suitable for high security applications. Covert marking of security devices is provided using the DNA matrix by creating and verifying unique DNA sequences. This integration of this into practical security features in combination with covert features based on DNA matrix authentication and other more straightforwardly authenticable features to provide multi- technology security solutions will be described.

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John K. Drinkwater, Zbynek Ryzi, and Chris S. Outwater "New flexible origination technology based on electron-beam lithography and its integration into security devices in combination with covert features based on DNA authentication", Proc. SPIE 4677, Optical Security and Counterfeit Deterrence Techniques IV, (19 April 2002); https://doi.org/10.1117/12.462712

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