Paper
1 July 2002 Characterization and characteristics of a ULE glass tailored for EUVL needs
Kenneth E. Hrdina, Benjamin Z. Hanson, Philip M. Fenn, Robert Sabia
Author Affiliations +
Abstract
The EUVL industry has unique material requirements, which are being addressed. Implementation of metrology methods new to ULE Glass will be discussed along with material characteristics altered to meet the needs of EUVL. Metrology methods include multiple means of evaluating the striae, CTE and inclusions. Material characteristics have been altered to better meet the demands of the industry. The reduction in inclusion levels along with other improvements such as in the area of striae will be discussed here. Improvements of greater than 4x were achieved in these preliminary striae reduction trials.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenneth E. Hrdina, Benjamin Z. Hanson, Philip M. Fenn, and Robert Sabia "Characterization and characteristics of a ULE glass tailored for EUVL needs", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472321
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CITATIONS
Cited by 17 scholarly publications and 5 patents.
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KEYWORDS
Glasses

Metrology

Extreme ultraviolet lithography

Ultrasonics

Inspection

Polishing

Silica

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