Large AFM scans with a nanometer coordinate measuring machine (NCMM)

Ralph Petersen; Hendrik Rothe; Dorothee Huser

doi:10.1117/12.451749

11 November 2002 Large AFM scans with a Nanometer Coordinate Measuring Machine

Ralph Petersen, Hendrik Rothe, Dorothee Huser

Proceedings Volume 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components; (2002) https://doi.org/10.1117/12.451749
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

With the increasing amount of applications in the field of nanotechnology there is a growing demand for a detailed inspection of surface areas of millimeter sizes. The geometry of silicon micro structures is as well of interest as the detection and shape characterization of defects on optical surfaces. It is state of the art to be able to measure topographies within 2 1/2 D with nanometer resolution by using scanning probe microscopes. So far they are usually restricted to area sizes of 100 square microns. Furthermore it is state of the art to build positioning systems covering several millimeters and resolving nanometers. Those systems are restricted in their positioning uncertainty, which can be estimated within several ten nanometers. Very few research labs and one or two industrial sites are involved in developments and investigations on combining large area positioning systems with atomic force probe heads. Systems being able to cover 6 decades (mm...nm) are highly sensitive to the choice of control parameters. We are investigating a prototype of such a system employing a calibration standard representing a lattice with 1 micron pitch width. Some "real life" semi conductor structures have been measured as well. Up to now the response of atomic force probe heads to the scanning motion of the table is not fully understood. The talk will reveal obstacles, their overcoming, and it will probe that realizing large area topography measurements with high resolution is possible. Futhermore, the need of strategies of selecting areas such that the amount of data can be handled in a reasonable way will be shown.

Citation Download Citation

Ralph Petersen, Hendrik Rothe, and Dorothee Huser "Large AFM scans with a Nanometer Coordinate Measuring Machine", Proc. SPIE 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, (11 November 2002); https://doi.org/10.1117/12.451749

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