Paper
19 February 2003 Hole drilling of glass-foam substrates with YAG laser
Makoto Emori, Yoshikazu Yoshida, Hiroshi Ogura, Shuhei Ueda
Author Affiliations +
Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486558
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
Using a 1.06 μm wavelength YAG laser, we have produced holes in glass-foam substrates. We have used three types of glass-foam made from 1-mm-thick quartz. The first type, called S1, contains 5% foam ranging in size from 2.0-50 μm. The second type, called S2, contains foam ranging in size from 0.1-0.5 μm. The third type, called S3, contains 12% foam ranging in size from 100-200 μm. We have drilled holes in these three types of glass-foam at pulse widths of 0.5-1.2msec and power of 0.5-3.0J. Only the S1 substrate is capable of creating a through hole at a power up to 0.8J. The height of the pile-up increases 15-40 μm with increasing power. The S1 substrate has better machinability than S2 and S3. The S1 substrate is suitable for laser beam machining.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makoto Emori, Yoshikazu Yoshida, Hiroshi Ogura, and Shuhei Ueda "Hole drilling of glass-foam substrates with YAG laser", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486558
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KEYWORDS
Quartz

YAG lasers

Foam

Silicon

Laser drilling

Dielectrics

Ranging

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