F2-laser microfabrication of sub-um gratings in fused silica

Juergen Ihlemann; Sabine Mueller; Stefan Puschmann; Dirk Schaefer; Peter R. Herman; Jianzhao Li; Midori Xiaoli Wei

doi:10.1117/12.468237

15 April 2003 F₂-laser microfabrication of sub-μm gratings in fused silica

Juergen Ihlemann, Sabine Mueller, Stefan Puschmann, Dirk Schaefer, Peter R. Herman, Jianzhao Li, Midori Xiaoli Wei

Proceedings Volume 4941, Laser Micromachining for Optoelectronic Device Fabrication; (2003) https://doi.org/10.1117/12.468237
Event: Photonics Fabrication Europe, 2002, Bruges, Belgium

Abstract

Submicron surface-relief gratings were fabricated on fused silica by laser ablation with nanosecond (ns) pulses from a high-resolution F₂-laser processing station. The grating relief was generated by imaging a transmission amplitude grating with a Schwarzschild objective of 25x demagnification. The chrome-coated CaF₂ mask had been structured by laser ablation at 193 nm to form a line and space pattern of 20-μm period. The F₂-laser generated gratings on fused silica were characterized by SEM, AFM and diffraction of a HeNe laser beam, yielding a grating period of 830 nm and a corrugation depth of 250 nm. Surface-relief gratings on optical materials are required for various applications such as grating demultiplexers for telecommunication components, light couplers for planar optical waveguides, Bragg reflectors, or alignment grooves for liquid crystals. Laser ablation is a rapid and flexible method to generate custom grating designs on a variety of materials.

Citation Download Citation

Juergen Ihlemann, Sabine Mueller, Stefan Puschmann, Dirk Schaefer, Peter R. Herman, Jianzhao Li, and Midori Xiaoli Wei "F₂-laser microfabrication of sub-μm gratings in fused silica", Proc. SPIE 4941, Laser Micromachining for Optoelectronic Device Fabrication, (15 April 2003); https://doi.org/10.1117/12.468237

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