NBTI improvement for pMOS by Cl-contained 1st oxidation in 20A/65A dual-nitrided gate oxide of 0.13-um CMOS technology

Ching-Chen Hao; Min-Hwa Chi; Chao-Chi Chen; Hung-Jen Lin; Yu-Fang Lin; C. H. Hsieh; Chih-Hsiung Lee; Kuang-Hui Chang; H. T. Wu; Chin-Heng Shen

doi:10.1117/12.485249

10 July 2003 NBTI improvement for pMOS by Cl-contained 1^st oxidation in 20A/65A dual-nitrided gate oxide of 0.13-μm CMOS technology

Ching-Chen Hao, Min-Hwa Chi, Chao-Chi Chen, Hung-Jen Lin, Yu-Fang Lin, C. H. Hsieh, Chih-Hsiung Lee, Kuang-Hui Chang, H. T. Wu, Chin-Heng Shen

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Proceedings Volume 5042, Design and Process Integration for Microelectronic Manufacturing; (2003) https://doi.org/10.1117/12.485249
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

A new method is demonstrated in this paper for improving the NBTI lifetime on pMOS by >3X for I/O (65A) transistors and >2X for core (20A) transistors by using Chlorine (Cl) contained 1st gate oxidation in an advanced dual gate oxide 0.13um CMOS technology. The improvement appears related to the residual SiCl bonds on the surface of core and I/O transistor areas (from the Cl-contained 1st oxidation). The transistor beta (as measured by I_dsat/(V_g-V_t)² at saturation mode) is improved (~10%) on pMOS and degraded slightly (~3%) on nMOS as an evidence for supporting this mechanism.

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Ching-Chen Hao, Min-Hwa Chi, Chao-Chi Chen, Hung-Jen Lin, Yu-Fang Lin, C. H. Hsieh, Chih-Hsiung Lee, Kuang-Hui Chang, H. T. Wu, and Chin-Heng Shen "NBTI improvement for pMOS by Cl-contained 1^st oxidation in 20A/65A dual-nitrided gate oxide of 0.13-μm CMOS technology", Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); https://doi.org/10.1117/12.485249

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