Study on readout of super-resolution pits with Si thin films

Jingsong Wei; Hao Ruan; Fuxi Gan

doi:10.1117/12.510309

9 April 2003 Study on readout of super-resolution pits with Si thin films

Jingsong Wei, Hao Ruan, Fuxi Gan

Proceedings Volume 5060, Sixth International Symposium on Optical Storage (ISOS 2002); (2003) https://doi.org/10.1117/12.510309
Event: Sixth International Symposium on Optical Storage (ISOS 2002), 2002, Wuhan, China

Abstract

By using Si thin film to replace the Al reflective layer in conventional ROM, the recording pits with a diameter of 380 nm and a depth of 50 nm are read out on the dynamic measuring equipment with a laser wavelength λ of 632.8 nm and a NA of 0.40. In the course of reproduction, the readout power is optimized, and the velocity is 5 m/s. The optimum Si thin film thickness is 25 nm and the CNR is 35 dB.

Citation Download Citation

Jingsong Wei, Hao Ruan, and Fuxi Gan "Study on readout of super-resolution pits with Si thin films", Proc. SPIE 5060, Sixth International Symposium on Optical Storage (ISOS 2002), (9 April 2003); https://doi.org/10.1117/12.510309

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