Nanosecond laser micro machining using an external beam attenuator

Johan Bosman; Henk Kettelarij; Corne J.G.M. de Kok

doi:10.1117/12.540504

18 November 2003 Nanosecond laser micro machining using an external beam attenuator

Johan Bosman, Henk Kettelarij, Corne J.G.M. de Kok

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540504
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

The pulse width -- pulse energy relationship of a solid-state laser can reduce the accuracy of micro machined features. Our goal is to control a depth of a laser mark with an accuracy of 0.1 μm and reduce the line width below the spot diameter. Reaching this depth and width in a stable and industrial viable laser process would not have been possible without the additional control generated by the beam attenuator.

Citation Download Citation

Johan Bosman, Henk Kettelarij, and Corne J.G.M. de Kok "Nanosecond laser micro machining using an external beam attenuator", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540504

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