Sub-wavelength grid patterns on silicon surface by pulsed CO2 laser irradiation

Wei-Jie Wang; M. F. Tan; Ming Hui Hong; Tow Chong Chong

doi:10.1117/12.540537

18 November 2003 Sub-wavelength grid patterns on silicon surface by pulsed CO₂ laser irradiation

Wei-Jie Wang, M. F. Tan, Ming Hui Hong, Tow Chong Chong

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540537
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Our previous paper reported on pulsed CO₂ laser induced periodic microstructures on the silicon substrates, which are coated with a thin material layer at the bottom surface to promote optical absorption. Our further study shows that two sets of parallel fringes generated at right angles can overlap and produce crossed-grid patterns when the laser pulse energy just crosses the thershold required for fringe formation. The fringe period is of sub-wavelength scale and the crossed-grid pattern is of grid size 2 μm by 2 μm. The fringes are considered to be due to the laser induced periodic surface structure (LIPSS) effect. The crossed-grid patterns are only possible when thermal bumps due to the thermal capillary wave effect are minimized, and they become re-writable at higher pulse energies.

Citation Download Citation

Wei-Jie Wang, M. F. Tan, Ming Hui Hong, and Tow Chong Chong "Sub-wavelength grid patterns on silicon surface by pulsed CO₂ laser irradiation", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540537

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