EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

Holger Kierey; Klaus F. Heidemann; Bernd H. Kleemann; Renate Winters; Wilhelm J. Egle; Wolfgang Singer; Frank Melzer; Rutger Wevers; Martin Antoni

doi:10.1117/12.507741

13 January 2004 EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing

Holger Kierey, Klaus F. Heidemann, Bernd H. Kleemann, Renate Winters, Wilhelm J. Egle, Wolfgang Singer, Frank Melzer, Rutger Wevers, Martin Antoni

Author Affiliations +

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.507741
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

The radiation emitted from an EUV source is collected and focused by a suitable collector system. A reflective blazed grating is used in -1st diffraction order to select a definite spectral band around 13.5 nm wavelength from the broad-band emission spectrum of the source. The effective grating area is segmented into a set of different plane gratings, mounted on a common base plate. In order to focus the light from the collector system, the grating segments are tilted and form a best-fit polygon surface. A specific groove density variation on the grating segments significantly improves the imaging performance. In this paper, we report on design, fabrication and testing of the grating system.

Citation Download Citation

Holger Kierey, Klaus F. Heidemann, Bernd H. Kleemann, Renate Winters, Wilhelm J. Egle, Wolfgang Singer, Frank Melzer, Rutger Wevers, and Martin Antoni "EUV spectral purity filter: optical and mechanical design, grating fabrication, and testing", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.507741

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