A common base for mask cost of ownership

Walter J. Trybula

doi:10.1117/12.518237

17 December 2003 A common base for mask cost of ownership

Walter J. Trybula

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518237
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

There has been a proliferation of examples of mask cost projections for future ITRS nodes and various technologies. This paper reviews the methodology developed at SEMATECH to insure that projected mask costs reflect the geometries being planned. A detailed description provides the development of the mask manufacturing process and develops a projected cost.

Citation Download Citation

Walter J. Trybula "A common base for mask cost of ownership", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518237

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