Passivation of the 157-nm pellicle with nanometer thin films

Yue Kuo; Jiang Lu; Jun-Yen Tewg; Paul A. Zimmerman

doi:10.1117/12.517506

17 December 2003 Passivation of the 157-nm pellicle with nanometer thin films

Yue Kuo, Jiang Lu, Jun-Yen Tewg, Paul A. Zimmerman

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.517506
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

The polymeric 157 nm pellicle was passivated on both sides to isolate it from environmental contamination. TAF pellicles were sputter deposited with 5 nm thick films of CaF₂, MgF₂, Al, Mg, TiN, SiN_x, Si, and PTFE, separately. The light transmission and life expectancy of the coated and uncoated pellicles were investigated. The coated pellicles were also analyzed with ESCA for surface structure changes. The coating process changed the pellicle's deterioration mechanism and life expectancy.

Citation Download Citation

Yue Kuo, Jiang Lu, Jun-Yen Tewg, and Paul A. Zimmerman "Passivation of the 157-nm pellicle with nanometer thin films", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.517506

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