Fabrication and characterization of PECVD-silicon-oxynitride-based waveguides

Marco I. Alayo; Denise Criado; Marcelo N. P. Carreno; Ines Pereyra

doi:10.1117/12.528699

28 May 2004 Fabrication and characterization of PECVD-silicon-oxynitride-based waveguides

Marco I. Alayo, Denise Criado, Marcelo N. P. Carreno, Ines Pereyra

Proceedings Volume 5355, Integrated Optics: Devices, Materials, and Technologies VIII; (2004) https://doi.org/10.1117/12.528699
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

In this work, silicon oxynitride (SiO_xN_y) films with different chemical compositions were deposited by plasma enhanced chemical vapor deposition (PECVD) technique and used as core and cladding in optical slab and strip waveguides in order to obtain high quality optical devices with low attenuations. The refractive index and optical loss measurements of the PECVD SiO_xN_y-based waveguides were obtained by a prism coupler system. On the other hand, etching experiments, using a Reactive Ion Etching (RIE) system, were also accomplished in order to define vertical walls on optical strip waveguide structures. The results of the optical characterizations showed that it is possible to obtain slab waveguides with optical loss as low as 0.4 dB/cm depending on the chemical composition of the core and cladding layers. In this way, the feasibility of using SiO_xN_y films for the fabrication of optical waveguide structures is demonstrated.

Citation Download Citation

Marco I. Alayo, Denise Criado, Marcelo N. P. Carreno, and Ines Pereyra "Fabrication and characterization of PECVD-silicon-oxynitride-based waveguides", Proc. SPIE 5355, Integrated Optics: Devices, Materials, and Technologies VIII, (28 May 2004); https://doi.org/10.1117/12.528699

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