Are ambient SO2 levels a valid indicator of projected acid gas filter life?

Andrew J Dallas; Lefei Ding; Jon Joriman; Brian Hoang; Jonathan G Parsons; Kevin Seguin

doi:10.1117/12.534102

24 May 2004 Are ambient SO₂ levels a valid indicator of projected acid gas filter life?

Andrew J Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Jonathan G Parsons, Kevin Seguin

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.534102
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The requirement to extend existing lithography equipment working levels and life has required manufacturers and end users to extend their filtration requirements beyond airborne base gases. Due to the effect acid gases can have on optics, masks, reticles, steppers, wafers, and metrology tools, they have become a more important molecular airborne contaminate to remove from inside a fab. SO₂ is known to be especially problematic within the cleanroom and exposure tool environment. However, a host of other molecular acids can also be found, some of which are present at considerably higher concentrations; the most prevalent of which are oxides of nitrogen, NO_x. Although the removal of NO_x contaminants is currently not considered to be as critical as SO₂, its presence can have a significant impact on acid gas sensitive applications. Several of these applications are addressed in this work in order to point out that NO_x contaminants do pose a problem, especially when considering the performance of acid gas chemical filters. More importantly, this preliminary work puts forth the recommendation that in addition to SO₂, the concentration of other acid gases should be taken into account when acid gas chemical filter efficiency and life estimates are being made.

Citation Download Citation

Andrew J Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Jonathan G Parsons, and Kevin Seguin "Are ambient SO₂ levels a valid indicator of projected acid gas filter life?", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.534102

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