Effect of background exposure dose upon line-edge roughness (LER)

Mike V. Williamson; Andrew R. Neureuther

doi:10.1117/12.535623

14 May 2004 Effect of background exposure dose upon line-edge roughness (LER)

Mike V. Williamson, Andrew R. Neureuther

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.535623
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

LER is found to correlate strongest with the background, or flare, portion of the lithographic aerial image contrast, when compared with the image slope and “standard” (max - min)/(max + min) contrast. A large pool of collected data and rigorous statistical analysis of variance conclude with far greater than 99% confidence that as any of these measures of aerial image profile degrade, LER increases. However, the relation between background exposure and LER is by far the most significant.

Citation Download Citation

Mike V. Williamson and Andrew R. Neureuther "Effect of background exposure dose upon line-edge roughness (LER)", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.535623

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