FIB mask repair technology for electron projection lithography

Yoh Yamamoto; Masakatsu Hasuda; Hiroyuki Suzuki; Makoto Sato; Osamu Takaoka; Hiroshi Matsumura; Noboru Matsumoto; Kouji Iwasaki; Ryoji Hagiwara; Katsumi Suzuki; Yutaka Ikku; Kazuo Aita; Takashi Kaito; Tatsuya Adachi; Anto Yasaka; Jiro Yamamoto; Teruo Iwasaki; Masaki Yamabe

doi:10.1117/12.557731

20 August 2004 FIB mask repair technology for electron projection lithography

Yoh Yamamoto, Masakatsu Hasuda, Hiroyuki Suzuki, Makoto Sato, Osamu Takaoka, Hiroshi Matsumura, Noboru Matsumoto, Kouji Iwasaki, Ryoji Hagiwara, Katsumi Suzuki, Yutaka Ikku, Kazuo Aita, Takashi Kaito, Tatsuya Adachi, Anto Yasaka, Jiro Yamamoto, Teruo Iwasaki, Masaki Yamabe

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557731
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

We have studied stencil mask repair technology with focused ion beam and developed an advanced mask repair tool for electron projection lithography. There were some challenges in the stencil mask repair, which were mainly due to its 3-dimensional structure with aspect ratio more than 10. In order to solve them, we developed some key technologies with focused ion beam (FIB). The transmitted FIB detection technique is a reliable imaging method for a 3-dimensional stencil mask. This technique makes it easy to observe deep patterns of the stencil mask and to detect the process endpoint. High-aspect processing can be achieved using gas-assisted etching (GAE) for a stencil mask. GAE enables us to repair mask patterns with aspect ratio more than 50 and very steep sidewall angle within 90±1°precisely. Edge placement accuracy of the developed tool is about 14nm by manual operation. This tool is capable to achieve less than 10nm by advanced software. It was found that FIB technology had capability to satisfy required specifications for EPL mask repair.

Citation Download Citation

Yoh Yamamoto, Masakatsu Hasuda, Hiroyuki Suzuki, Makoto Sato, Osamu Takaoka, Hiroshi Matsumura, Noboru Matsumoto, Kouji Iwasaki, Ryoji Hagiwara, Katsumi Suzuki, Yutaka Ikku, Kazuo Aita, Takashi Kaito, Tatsuya Adachi, Anto Yasaka, Jiro Yamamoto, Teruo Iwasaki, and Masaki Yamabe "FIB mask repair technology for electron projection lithography", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557731

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available