Simulation of the EUV-lithography projection system and nanometer features imaging

Nikolay B. Voznesensky; Alexander P. Zhevlakov

doi:10.1117/12.560163

10 June 2004 Simulation of the EUV-lithography projection system and nanometer features imaging

Nikolay B. Voznesensky, Alexander P. Zhevlakov

Proceedings Volume 5482, Laser Optics 2003: Superintense Light Fields and Ultrafast Processes; (2004) https://doi.org/10.1117/12.560163
Event: Laser Optics 2003, 2003, St. Petersburg, Russian Federation

Abstract

The illumination system presented in the paper consists of an elliptical mirror collecting light in the solid angle over 103 and two plane mirrors (one of them is a grazing incidence mirror). The projection lens consists of two 4^th-order aspherical mirrors with the diminished obscuration 0.36. The simultaneous exposure wafer area is 0.82 x 0.82 mm² and NA = 0.36. The obscuration of the projection lens and obscured aperture of the illumination system influence the contrast of nanometer features of image. Mathematical simulation of imaging by the partially coherent theory is performed for target bars with L&S 15, 30, and 45 nanometers. The results of computer simulation give the reliable values of contrast 0.50, 0.58 and 0.6 correspondingly.

Citation Download Citation

Nikolay B. Voznesensky and Alexander P. Zhevlakov "Simulation of the EUV-lithography projection system and nanometer features imaging", Proc. SPIE 5482, Laser Optics 2003: Superintense Light Fields and Ultrafast Processes, (10 June 2004); https://doi.org/10.1117/12.560163

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