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29 September 2004 Requirements and designs of illuminators for microlithography
Paul Michaloski
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Proceedings Volume 5525, Laser Beam Shaping V; (2004) https://doi.org/10.1117/12.563941
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States
Abstract
The beam shaping by illuminators of microlithographic optical systems is a key technological contributor to the advancement of mass production of integrated circuits. The following examines both the requirements and the design of these illumination systems. The importance of partial coherence, off-axis illumination, polarization, telecentricity and uniformity for the lithographic process are discussed. The design sections cover the systems from source to reticle, including the use of diffusers, axicons, kaleidoscopes and fly's eyes arrays.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Paul Michaloski "Requirements and designs of illuminators for microlithography", Proc. SPIE 5525, Laser Beam Shaping V, (29 September 2004); https://doi.org/10.1117/12.563941
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KEYWORDS
Fiber optic illuminators
Semiconducting wafers
Diffusers
Lithography
Reticles
Lamps
Optical lithography
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