New multilayer coating for 30.4-nm radiation

Ichiro Yoshikawa; Tetsunori Murachi

doi:10.1117/12.558976

18 October 2004 New multilayer coating for 30.4-nm radiation

Ichiro Yoshikawa, Tetsunori Murachi

Proceedings Volume 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II; (2004) https://doi.org/10.1117/12.558976
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

A multilayer coating of Mo/Si is usually used as an EUV optics for space science, especially for He-II (30.4nm) radiation, because it is highly stable under vacuum and atmosphere. The fairly high reflectivity of 15-20% was achieved. But space science community will need higher reflective coating at 30.4 nm radiation for the future satellite missions. In this work, for developing new multilayer mirror of He-II radiations, we report the design of a multilayer, consisting of a pair of Mg and SiC, and its fabrication, and result of the reflectance with the monthly degradation under the atmosphere circumstance.

Citation Download Citation

Ichiro Yoshikawa and Tetsunori Murachi "New multilayer coating for 30.4-nm radiation", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.558976

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