Optimization and analysis of depth-graded multilayer structures

David M. Broadway; Yuriy Y. Platonov; Vladimir V. Martynov; Pao-Kuang Kuo

doi:10.1117/12.561446

3 November 2004 Optimization and analysis of depth-graded multilayer structures

David M. Broadway, Yuriy Y. Platonov, Vladimir V. Martynov, Pao-Kuang Kuo

Proceedings Volume 5537, X-Ray Sources and Optics; (2004) https://doi.org/10.1117/12.561446
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

We introduce a method for the determination of the thickness variation through the stack of multilayer structures deposited by magnetron sputter deposition. The deposited structure is determined by minimizing a merit function based on the difference between actual x-ray reflectivity data and the theoretical calculation of the reflectivity from a multilayer structure. This method uses only four parameters and is independent of the total number of layers deposited. Further, this simple method provides a good initial guess if one wishes to increase the number of independent parameters in order to investigate finer detail of the structure. We illustrate the usefulness of this method through comparison of a desired and deposited Ni/C multilayer. The thickness distribution through the stack was designed in such a way as to maximize integrated reflectivity over some angular range. Finally, we determine the dependence of layer thickness with annealing temperature for the depth graded Ni/C multilayer by use of our method.

Citation Download Citation

David M. Broadway, Yuriy Y. Platonov, Vladimir V. Martynov, and Pao-Kuang Kuo "Optimization and analysis of depth-graded multilayer structures", Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); https://doi.org/10.1117/12.561446

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