The advanced nanofabrication technology

Ming Liu; Qiuxia Xu; Baoqin Chen; Changqing Xie; Tianchun Ye; Xinchun Liu

doi:10.1117/12.570206

27 January 2005 The advanced nanofabrication technology

Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.570206
Event: Photonics Asia, 2004, Beijing, China

Abstract

Some research results in advanced optical lithography, Electron beam lithography, X-ray lithography are introduced in this paper. For advanced optical lithography, optical proximity correction and phase-shift masking (PSM) are studied, and 150nm pattern is achieved by i-line Stepper using transparent PSM. For e-beam lithography, the resist process, proximity effect correction and mix & match technologies are investigated, and 27nm CMOS device is successfully fabricated. The 0.15μm GaAs PHEMT devices are successfully fabricated by employing X-ray lithography.

Citation Download Citation

Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, and Xinchun Liu "The advanced nanofabrication technology", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.570206

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available