Optical properties of homoepitaxial and heteroepitaxial ZnO grown by molecular beam epitaxy

C. J. Pan; C. W. Tu; J. J. Song; G. Cantwell; C. C. Lee; B. J. Pong; G. C. Chi

doi:10.1117/12.590388

28 April 2005 Optical properties of homoepitaxial and heteroepitaxial ZnO grown by molecular beam epitaxy

C. J. Pan, C. W. Tu, J. J. Song, G. Cantwell, C. C. Lee, B. J. Pong, G. C. Chi

Proceedings Volume 5722, Physics and Simulation of Optoelectronic Devices XIII; (2005) https://doi.org/10.1117/12.590388
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

Homoepitaxial and heteroepitaxial ZnO films were grown by plasma-assisted molecular beam epitaxy (P-MBE). Homoepitaxial ZnO layers were grown on an O-face melt-grown ZnO (0001) substrate. Heteroepitaxial ZnO layers were grown on an epitaxial GaN template predeposited by metalorganic chemical vapor deposition on a c-plane sapphire substrate. There exists a residual strain in the heteroepitaxial ZnO, which is ε = -0.25%. Low-intensity excitation PL spectra of ZnO epilayers excited by a He-Cd laser exhibit only bound-exciton emission with phonon replicas. The quality of ZnO epilayers is better than that of ZnO substrate. However, under high-intensity excitation by a N2 laser, the emission due to exciton-exciton collisions dominates the PL spectrum from heteroepitaxial ZnO layer but is not observed from homoepitaxial ZnO layer.

Citation Download Citation

C. J. Pan, C. W. Tu, J. J. Song, G. Cantwell, C. C. Lee, B. J. Pong, and G. C. Chi "Optical properties of homoepitaxial and heteroepitaxial ZnO grown by molecular beam epitaxy", Proc. SPIE 5722, Physics and Simulation of Optoelectronic Devices XIII, (28 April 2005); https://doi.org/10.1117/12.590388

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