Optical properties of a SiO2 photonic crystal layer fabricated by seeded growth of spherical nanoparticles

Dong C. Shin; Myung S. Kim; Yong Taeg O; Sang Jin Hong; Beom Gyu Lee

doi:10.1117/12.588069

13 April 2005 Optical properties of a SiO₂ photonic crystal layer fabricated by seeded growth of spherical nanoparticles

Dong C. Shin, Myung S. Kim, Yong Taeg O, Sang Jin Hong, Beom Gyu Lee

Author Affiliations +

Proceedings Volume 5733, Photonic Crystal Materials and Devices III; (2005) https://doi.org/10.1117/12.588069
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

The photonic band gap of self-assembled thin film could be controlled precisely in this study using the seeded growth of spherical SiO₂ nanoparticles. The monodispersed SiO₂ nanoparticles were fabricated using the Stober process. The nanoparticle with the narrowest particle size distribution was used as the nucleation seed. The particle size could be controlled to between 50 nm and 1000 nm using the Stober process and seeded growth methods. When the seed content exceeded 0.1 wt% in solution, no new particles were observed and narrow size distribution was thus obtained. A self-assembled thin film was prepared on a glass substrate by evaporation with capillary extraction. A linear relationship was observed between the average particle size and the photonic band gap according to the transmittance and reflectance measurements. The variation of photonic band gap was well matched with the theoretical consideration of Bragg's diffraction law.

Citation Download Citation

Dong C. Shin, Myung S. Kim, Yong Taeg O, Sang Jin Hong, and Beom Gyu Lee "Optical properties of a SiO₂ photonic crystal layer fabricated by seeded growth of spherical nanoparticles", Proc. SPIE 5733, Photonic Crystal Materials and Devices III, (13 April 2005); https://doi.org/10.1117/12.588069

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