Paper
6 December 2006 Influence of object position on accuracy of optical measurement systems
Author Affiliations +
Proceedings Volume 5945, 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 59450S (2006) https://doi.org/10.1117/12.638925
Event: 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2005, Nitra, Slovakia
Abstract
The work analyses an influence of the change of object position on the accuracy of optical and optoelectronic measurement systems using both geometrical and diffraction theory. It is shown that in case of the change of position of the measured object the imaging properties of the used optical measurement instrument are changed. This position change affects the image quality. If some optical measurement system is aberration free for a specified position of the measured object, then for other object positions the optical system has aberrations. The consequence of this effect is the change of the measurement accuracy for the specific optical system. The described effect is not removable on principle and it is necessary to take account to it in high accuracy measurements.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Antonin Miks and Jiri Novak "Influence of object position on accuracy of optical measurement systems", Proc. SPIE 5945, 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 59450S (6 December 2006); https://doi.org/10.1117/12.638925
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Cited by 1 scholarly publication.
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KEYWORDS
Diffraction

Imaging systems

Optical testing

Optical imaging

Point spread functions

Image quality

Monochromatic aberrations

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