An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks

C. H. Zhang; C. C. Ji; J. G. Shi; S. Katsuki; A. Kimura; H. Fukumoto; H. Akiyama

doi:10.1117/12.674192

9 June 2006 An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks

C. H. Zhang, C. C. Ji, J. G. Shi, S. Katsuki, A. Kimura, H. Fukumoto, H. Akiyama

Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 614905 (2006) https://doi.org/10.1117/12.674192
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China

Abstract

Non-equilibrium ionization plays a critical role in Z-pinch gas discharge produced plasma (GDPP) EUV source. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. With the learning and generalization abilities, artificial neural networks (ANN) have been applied to model and optimize a Z-pinch plasma source, which is characterized with a experimental design at varied operational parameters including electric power input, applied voltage/current, pulse repetition, MPC parameters, electrode geometry, xenon flow rate as well as convention efficiency, EUV source size, radiation power etc.

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C. H. Zhang, C. C. Ji, J. G. Shi, S. Katsuki, A. Kimura, H. Fukumoto, and H. Akiyama "An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614905 (9 June 2006); https://doi.org/10.1117/12.674192

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KEYWORDS

Extreme ultraviolet

Plasma

Neurons

Artificial neural networks

Xenon

Extreme ultraviolet lithography

Electrodes

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