Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation

Takashi Takahashi; Susumu Saito; Toshiki Okumura; Etsuya Suzuki; Tatsuya Kojima; Shinsuke Motomiya; Hidesuke Maruyama; Hitoshi Suzuki; Koji Machida; Toru Tojo

doi:10.1117/12.654700

24 March 2006 Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation

Takashi Takahashi, Susumu Saito, Toshiki Okumura, Etsuya Suzuki, Tatsuya Kojima, Shinsuke Motomiya, Hidesuke Maruyama, Hitoshi Suzuki, Koji Machida, Toru Tojo

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61523P (2006) https://doi.org/10.1117/12.654700
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

In this paper, a newly developed optical lens cementing technology is reported. Here, a fluoride material is used as an optical cement which can reduce damage from DUV radiation. The degradation of transmittance and the accuracy of surface of the cemented optical elements including adhesive used for cementing have been evaluated after prolonged DUV irradiation. It has been shown that with 248 nm wavelength this cement works quite well, and moreover, even with 193 nm wavelength, when used for 1000 hours, the change in transmittance was negligible where average irradiation power was kept within 300mW/cm². Hence for all practical purpose the use of this cement in microscope objective is quite acceptable for 248 nm applications, thus confirming that this cementing technology is satisfactory and meets the performance requirement of DUV inspection systems.

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Takashi Takahashi, Susumu Saito, Toshiki Okumura, Etsuya Suzuki, Tatsuya Kojima, Shinsuke Motomiya, Hidesuke Maruyama, Hitoshi Suzuki, Koji Machida, and Toru Tojo "Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523P (24 March 2006); https://doi.org/10.1117/12.654700

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KEYWORDS

Adhesives

Cements

Transmittance

Deep ultraviolet

Objectives

Microscopes

Inspection

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