Study of thin TiC<sub>x</sub>N<sub>1-x</sub> films fabricated by hybrid magnetron-laser deposition

Tomáš Kocourek; Miroslav Jelínek; Václav Studnička; Jaromír Kadlec

doi:10.1117/12.675656

18 April 2006 Study of thin TiC_xN_1-x films fabricated by hybrid magnetron-laser deposition

Tomáš Kocourek, Miroslav Jelínek, Václav Studnička, Jaromír Kadlec

Proceedings Volume 6180, Photonics, Devices, and Systems III; 61800G (2006) https://doi.org/10.1117/12.675656
Event: Photonics, Devices, and Systems III, 2005, Prague, Czech Republic

Abstract

Titanium- carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited on the same Si substrate, dimensions of 3 cm × 3 cm. Films were fabricated in argon- nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of 15 Jcm^-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES).

Citation Download Citation

Tomáš Kocourek, Miroslav Jelínek, Václav Studnička, and Jaromír Kadlec "Study of thin TiC_xN_1-x films fabricated by hybrid magnetron-laser deposition", Proc. SPIE 6180, Photonics, Devices, and Systems III, 61800G (18 April 2006); https://doi.org/10.1117/12.675656

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