InN as THz emitter excited at 1060 nm and 800 nm

Boris Pradarutti; Gabor Matthäus; Claudia Brückner; Stefan Riehemann; Gunther Notni; Stefan Nolte; Volker Cimalla; Vadim Lebedev; Oliver Ambacher; Andreas Tünnermann

doi:10.1117/12.662301

19 April 2006 InN as THz emitter excited at 1060 nm and 800 nm

Boris Pradarutti, Gabor Matthäus, Claudia Brückner, Stefan Riehemann, Gunther Notni, Stefan Nolte, Volker Cimalla, Vadim Lebedev, Oliver Ambacher, Andreas Tünnermann

Author Affiliations +

Proceedings Volume 6194, Millimeter-Wave and Terahertz Photonics; 61940I (2006) https://doi.org/10.1117/12.662301
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

InN, a novel semiconductor material, is used as THz surface emitter. The material is irradiated with fs-laser pulses at 1060 nm and 800 nm and the emitted ultrashort THz pulses are measured by phase sensitive detection. Pulsforms, amplitudes and spectra are compared to the THz emission of p-doped InAs, the standard material for THz surface emission.

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Boris Pradarutti, Gabor Matthäus, Claudia Brückner, Stefan Riehemann, Gunther Notni, Stefan Nolte, Volker Cimalla, Vadim Lebedev, Oliver Ambacher, and Andreas Tünnermann "InN as THz emitter excited at 1060 nm and 800 nm", Proc. SPIE 6194, Millimeter-Wave and Terahertz Photonics, 61940I (19 April 2006); https://doi.org/10.1117/12.662301

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