A study of damage mechanisms during EUV mask substrate cleaning

Abbas Rastegar; Sean Eichenalub; Kurt Goncher; Pat Marmillion

doi:10.1117/12.681841

20 May 2006 A study of damage mechanisms during EUV mask substrate cleaning

Abbas Rastegar, Sean Eichenalub, Kurt Goncher, Pat Marmillion

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62830I (2006) https://doi.org/10.1117/12.681841
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Defects on an extreme ultraviolet (EUV) mask blank strongly depend on the defects on the mask blank substrate. Any imperfection on the substrate surface in the form of a particle, pit, and scratch will appear on the EUV mask blank. In this article, we study the effect of the cleaning process on the creation of defects on the EUV substrate and mask blank. Added particles could be removed by improving the cleaning tool and the cleaning process. Pits are generally created when many large defects, particularly glass-like materials, are present on the surface and the substrate is exposed to a high energy cleaning step. Comparison of different high energy steps in a typical cleaning process suggests that the megasonic step most likely creates pits. Current cleaning processes developed in the Mask Blank Development Center (MBDC) have been optimized so that no added pits or particles are observed after using them.

Citation Download Citation

Abbas Rastegar, Sean Eichenalub, Kurt Goncher, and Pat Marmillion "A study of damage mechanisms during EUV mask substrate cleaning", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830I (20 May 2006); https://doi.org/10.1117/12.681841

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available