Design, fabrication, and integration of micro/nano-scale photonic crystal devices and plasmonic devices for VLSI photonic integration application

El-Hang Lee; B. H. O; H. S. Noh; S. H. Song; S. G. Lee; S. G. Park

doi:10.1117/12.680469

13 September 2006 Design, fabrication, and integration of micro/nano-scale photonic crystal devices and plasmonic devices for VLSI photonic integration application

El-Hang Lee, B. H. O, H. S. Noh, S. H. Song, S. G. Lee, S. G. Park

Author Affiliations +

Proceedings Volume 6327, Nanoengineering: Fabrication, Properties, Optics, and Devices III; 632705 (2006) https://doi.org/10.1117/12.680469
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

We present on the design, fabrication and integration of micro/nano-scale photonic crystal devices and plasmonic optical devices for VLSI photonic integration application. Using photonic crystals, we design and fabricate nanoscale directional couplers, multimode interference devices, power splitters, wavelength splitters, triplexers, filters, and develop their integration and interconnection schemes and technology. Using plasmonic structures, we design and fabricate horizontal directional couplers, vertical directional couplers, and chirped grating plasmonic structures to generate subwavelength lightwaves to be focused onto nano-potonic devices and modules. We examine scientific and technological issues concerning the miniaturization, interconnection, and integration of these nano-scale photonic devices for applications toward functional VLSI integrated circuits and systems.

Citation Download Citation

El-Hang Lee, B. H. O, H. S. Noh, S. H. Song, S. G. Lee, and S. G. Park "Design, fabrication, and integration of micro/nano-scale photonic crystal devices and plasmonic devices for VLSI photonic integration application", Proc. SPIE 6327, Nanoengineering: Fabrication, Properties, Optics, and Devices III, 632705 (13 September 2006); https://doi.org/10.1117/12.680469

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