A novel Alt-PSM structure: isn't this an embedded Atten-PSM?

S. Nakao; K. Hosono; S. Maejima; K. Narimatsu; T. Hanawa; K. Suko

doi:10.1117/12.692820

20 October 2006 A novel Alt-PSM structure: isn't this an embedded Atten-PSM?

S. Nakao, K. Hosono, S. Maejima, K. Narimatsu, T. Hanawa, K. Suko

Proceedings Volume 6349, Photomask Technology 2006; 63492Q (2006) https://doi.org/10.1117/12.692820
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

A novel mask structure for an alternating aperture phase shift mask (Alt-PSM) to cut mask cost is proposed. By a mask with structure of an embedded attenuating phase shift mask (Atten-PSM), an Alt-PSM for an isolated line formation can be well fabricated. Fine image quality is confirmed with optical image calculations. Moreover, concept of this novel mask is proved by a preliminary experiment. In conclusion, this novel mask can replace conventional Alt-PSM for logic devices, resulting in considerable cut of mask cost.

Citation Download Citation

S. Nakao, K. Hosono, S. Maejima, K. Narimatsu, T. Hanawa, and K. Suko "A novel Alt-PSM structure: isn't this an embedded Atten-PSM?", Proc. SPIE 6349, Photomask Technology 2006, 63492Q (20 October 2006); https://doi.org/10.1117/12.692820

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