Paper
8 February 2007 Growth and polarity control of GaN and AlN on carbon-face SiC by metalorganic vapor phase epitaxy
Yi Fu, Q. Fan, S. Chevtchenko, Ü. Özgür, H. Morkoç, You Ke, Robert Devaty, W. J. Choyke, C. K. Inoki, T. S. Kuan
Author Affiliations +
Abstract
Growth and polarity control of GaN and AlN on carbon-face SiC (C-SiC) by metalorganic vapor phase epitaxy (MOVPE) are reported. The polarities of GaN and AlN layers were found to be strongly dependent on the pre-growth treatment of C-SiC substrates. A pre-flow of trimethyaluminum (TMAl) or a very low NH3/TMAl ratio resulted in Al(Ga)-polarity layers on C-SiC. Otherwise, N-polarity layers resulted. The polarities of AlN and GaN layers were conveniently determined by their etching rate in KOH or H3PO4, namely the etching rate on N-polarity is substantial larger, a method reported earlier. We suggest that the Al adatoms form several Al adlayers on C-SiC and change the incorporation sequence of Ga(Al) and N leading to a metal polarity surface. In addition, the hexagonal pyramids, typical on N-polarity GaN surface, are absent on N-polarity GaN grown on off-axis C-SiC owing to high density of terraces on the substrate surface. The properties of GaN layers grown on C-SiC have been studied by X-ray diffraction and are reported in this paper.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Fu, Q. Fan, S. Chevtchenko, Ü. Özgür, H. Morkoç, You Ke, Robert Devaty, W. J. Choyke, C. K. Inoki, and T. S. Kuan "Growth and polarity control of GaN and AlN on carbon-face SiC by metalorganic vapor phase epitaxy", Proc. SPIE 6473, Gallium Nitride Materials and Devices II, 647305 (8 February 2007); https://doi.org/10.1117/12.706938
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Cited by 5 scholarly publications.
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KEYWORDS
Gallium nitride

Aluminum nitride

Silicon carbide

Etching

Scanning electron microscopy

Aluminum

Annealing

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