A study of EUV resist outgassing characteristics using a novel outgas analysis system

Julius Joseph Santillan; Minoru Toriumi; Toshiro Itani

doi:10.1117/12.711264

22 March 2007 A study of EUV resist outgassing characteristics using a novel outgas analysis system

Julius Joseph Santillan, Minoru Toriumi, Toshiro Itani

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651944 (2007) https://doi.org/10.1117/12.711264
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We have designed a novel outgas analysis system to help gain a better understanding of EUV resist outgassing characteristics. In this paper, we will discuss the performance results of this outgas analysis system which incorporates a stand-alone discharge produced plasma extreme ultra violet (EUV) source of comparatively high power output and various outgas evaluation methods such as quadropole mass spectrometry (QMS), gas chromatography - mass spectrometry (GC-MS), quartz crystal microbalance (QCM) and 'witness mirror'. In this analysis system, the GC-MS evaluation set-up is quite unique from the commonly available outgassing systems with the utilization of the 'cold-trap sampling technique'. In this sampling technique; a 'trap box' is used with an cryostat-based internal cooling system used to lower the trap-box temperature to increase the efficiency of the trapping of outgas elements released from the resist wafer fragment during exposure. After exposure, the trap-box is then transferred to a heating chamber where the outgas elements that have adhered is heated and released to a thermal desorption tube for GC-MS analysis. After successive experiments using a polymer resist, we have succeeded in proving the improved efficiency of outgas trapping through the cold-trap method. Compared to the amount of trapped outgas at room temperature, a considerable amount of resist outgas was measured with the trap-box cooled at very low temperatures. With the QMS analysis results, it was also observed that the low molecular-type resist released lesser outgassing elements compared to the polymer resist. This work is partially supported by the New Energy and Industrial Technology Development Organization (NEDO).

Citation Download Citation

Julius Joseph Santillan, Minoru Toriumi, and Toshiro Itani "A study of EUV resist outgassing characteristics using a novel outgas analysis system", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651944 (22 March 2007); https://doi.org/10.1117/12.711264

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