Paper
2 May 2007 Radiation damage, range distribution, and site location measurements by channeling technique for Ar, Kr, Xe in Ni after implantation and annealing
G. D. Tolstolutskaya, I. E. Kopanetz, I. M. Neklyudov
Author Affiliations +
Proceedings Volume 6634, International Conference on Charged and Neutral Particles Channeling Phenomena II; 66340W (2007) https://doi.org/10.1117/12.741916
Event: International Conference on Charged and Neutral Particles Channeling Phenomena II, 2006, Rome, Italy
Abstract
By the methods of channeling and mathematical simulation the distribution profiles of damage produced in Ni under irradiation by ions of He+, Ar+, Kr+, , Xe+ with energy 0.2-1 MeV in the range of doses 1015 ÷ 1017 cm-2 are investigated. Location of the implanted atoms of Xe in a Ni monocrystal lattice is determined; their interaction with radiation defects, kinetics of impurity complexes formation and their configuration are defined.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. D. Tolstolutskaya, I. E. Kopanetz, and I. M. Neklyudov "Radiation damage, range distribution, and site location measurements by channeling technique for Ar, Kr, Xe in Ni after implantation and annealing", Proc. SPIE 6634, International Conference on Charged and Neutral Particles Channeling Phenomena II, 66340W (2 May 2007); https://doi.org/10.1117/12.741916
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Ions

Nickel

Xenon

Krypton

Crystals

Chemical species

Argon

Back to Top