Influence on optical and electrical properties of silver layer by adjoining Ta2O5 layers

Pei Zhao; Dingquan Liu; Xiaofeng Xu; Fengshan Zhang

doi:10.1117/12.782946

14 November 2007 Influence on optical and electrical properties of silver layer by adjoining Ta₂O₅ layers

Pei Zhao, Dingquan Liu, Xiaofeng Xu, Fengshan Zhang

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 672212 (2007) https://doi.org/10.1117/12.782946
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

Two kinds of structural film stacks, Ta₂O₅\Ag and Ta₂O₅\Ag\Ta₂O₅, were made for investigating the influence on the optical and electrical properties of ultra-thin Ag film by e adjoining Ta₂O₅ layers. Different samples were prepared by changing the deposition condition of Ta₂O₅ with different Argon pressure and sputter power. All samples have a uniform 6nm thickness of Ag layer controlled by deposition time. Optical and electrical measurements were carried out on samples and from the transmission and reflectance spectrum the optical constants can be derived. For Ta₂O₅\Ag film stacks, from measurement we found that the optical and electrical properties of 6nm Ag film strongly depend on the deposition condition of Ta₂O₅ layers. The sheet resistance is changed from 12Ω to 31Ω and reflectance is changed from 21% to 46% at 2500nm wavelength, which indicate the difference in Ag layer structure. But for the Ta₂O₅\Ag\Ta₂O₅ stacks, the changed deposition condition of the upper Ta₂O₅ layers just bring slightly shift of the optical and electrical property.

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Pei Zhao, Dingquan Liu, Xiaofeng Xu, and Fengshan Zhang "Influence on optical and electrical properties of silver layer by adjoining Ta₂O₅ layers", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 672212 (14 November 2007); https://doi.org/10.1117/12.782946

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KEYWORDS

Silver

Tantalum

Resistance

Reflectivity

Sputter deposition

Transmittance

Interfaces

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