Wavefront measurement based on active deflectometry

Yuankun Liu; Xianyu Su; Qican Zhang

doi:10.1117/12.783323

17 January 2008 Wavefront measurement based on active deflectometry

Yuankun Liu, Xianyu Su, Qican Zhang

Author Affiliations +

Proceedings Volume 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 67232N (2008) https://doi.org/10.1117/12.783323
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

In this paper, a new wavefront measurement is proposed, which is based on active deflectormetry and phase-shift technique. The deflections of imaging rays caused by a phase object could be measured accurately with the phase-shift technique and a removable TFT flat panel to display both the horizontal and vertical sinusoidal intensity patterns respectively, and then the wavefront distribution could be calculated. When a phase object is placed between a display and a calibrated CCD camera, the intensity patterns will be distorted. The distortion can be measured, and another different distortion can be got by moving the display. Then the ray deflections can be measured as well as the gradients of phase shift caused by the object. Therefore the wavefront can be reconstructed. Experimental results show the feasibility of this method. Compared with other techniques, this technique is simpler, cheaper and more flexible.

Citation Download Citation

Yuankun Liu, Xianyu Su, and Qican Zhang "Wavefront measurement based on active deflectometry", Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67232N (17 January 2008); https://doi.org/10.1117/12.783323

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