Paper
19 December 1986 New High Resolution Phase Conjugated Optical Correctors For Diffraction Limited Applications
Luc Dame
Author Affiliations +
Abstract
Diffraction limited use of optics, especially in Ultra Violet, requires correction of residual wavefront errors ranging from slight decentring to rough ripples. A new and very sensitive method using coherent UV light (257 nm) and a diverging Michelson Twymann interferometric set up, allows to generate by phase conjugation a perfect replica of residual wavefront errors directly in a photoresist thin film, in a one step process. Used in conjunction with the recording mirror or objective, this treated (coated) photoresist compensates any residual wavefront deviations down to possibly x/40 peak to peak. A 10 cm spherical mirror of phase defects amplitude x/14 peak to peak on the mirror surface (x/7 on the wavefront) was used to generate such a phase conjugated corrector. Interferometric testing in the UV (257nm) of the mirror plus corrector assembly yield a very good figure : x/24 peak to peak on the wavefront. Such a system is already diffraction limited down to 200 nm and even further in UV since the correlation length of the residual defects is large. This method could also be applied to large mirrors correction (the interferometer is actively stabilized using synchrone detection) which might significatively reduce their polishing cost.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luc Dame "New High Resolution Phase Conjugated Optical Correctors For Diffraction Limited Applications", Proc. SPIE 0679, Current Developments in Optical Engineering and Diffraction Phenomena, (19 December 1986); https://doi.org/10.1117/12.939584
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KEYWORDS
Mirrors

Interferometers

Wavefronts

Photoresist materials

Diffraction

Ultraviolet radiation

Interferometry

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